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arXiv 1104.3267cond-mat.mtrl-sci
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BiFeO3薄膜中~(71)O畴壁的导电

Conduction through 71o domain walls in BiFeO3 thin films

S. Farokhipoor, B. Noheda

摘要:

研究了主要含有71 °畴壁的BiFeO_3薄膜中畴和畴壁的局域导电。在室温下的测量揭示了通过71 o畴壁的传导。在足够高的温度下也可以观察到通过域的传导。研究发现,尽管畴的电导率较低,但两者都受相同的机制控制:在低电压区,缺陷态的电子被温度激活,但电流受铁电表面电荷的限制;在大电压状态下,发生肖特基发射,并且氧空位的作用是选择性地增加壁处的费米能并局部地降低肖特基发射。屏障这种理解提供了在氧化物中设计传导路径的关键。

英文摘要:

Local conduction at domains and domains walls is investigated in BiFeO3 thin films containing mostly 71o domain walls. Measurements at room temperature reveal conduction through 71o domain walls. Conduction through domains could also be observed at high enough temperatures. It is found that, despite the lower conductivity of the domains, both are governed by the same mechanisms: in the low voltage regime electrons trapped at defect states are temperature-activated but the current is limited by the ferroelectric surface charges; in the large voltage regime, Schottky emission takes place and the role of oxygen vacancies is that of selectively increasing the Fermi energy at the walls and locally reducing the Schottky barrier. This understanding provides the key to engineering conduction paths in oxides.

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