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arXiv 2011.13618cond-mat.mtrl-sci
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Characteristics of Al/Ge Schottky and Ohmic contacts at low temperatures

Shreyas Pitale, Manoranjan Ghosh, S. G. Singh, Husain Manasawala, G. D. Patra, Shashwati Sen

英文摘要:

Schottky barrier contact has been fabricated by thermal deposition of Al on (100) Ge (impurity concentration~1010/cm3 at 80K) that shows extrinsic p-type to intrinsic n-type transition near 180K. Both p and n-type Ge exhibits ideal Schottky behaviour with low reverse current and near unity ideality factors obtained from the linear form of temperature dependent current-voltage (I-V) characteristics. The diode current at various temperatures change its direction at non-zero applied bias that reflects a shift in position of charge neutrality level (CNL) from the Fermi level of Ge. With the rise in temperature, Schottky barrier height (SBH) steadily increases for p-Ge that can be understood on the basis of observed variation in CNL. Values of SBH determined from the zero bias Richardson plot agrees well with that estimated from the Schottky-Mott rule for strongly pinned interface. Activation energies are determined from the Richardson plot at various forward voltages and found to decrease with applied bias for n-Ge but reduces to zero for p-Ge that shows work function similar to Al. Annealing of Al/Ge induces regrowth of p-type Al doped Ge layer that exhibits gradual reduction of Al concentration towards p-Ge crystal. Al doped Ge(P+)/Ge (P) junction thus fabricated shows linear current-voltage (I-V) characteristics in the extrinsic region (below 180K). In the intrinsic region (above 180K), rectification is observed in the I-V curve due to temperature dependent change in conductivity of both Al doped Ge layer and Ge crystal.

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