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arXiv 1409.6956physics.ins-dethep-ex
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一种模拟质子辐照硅条传感器表面特性的方法

A Method to Simulate the Observed Surface Properties of Proton Irradiated Silicon Strip Sensors

Timo Peltola, Ashutosh Bhardwaj, Ranjeet Dalal, Robert Eber, Thomas Eichhorn, Kavita Lalwani, Alberto Messineo, Martin Printz, Kirti Ranjan

摘要:

在CERN世界上最大的粒子物理加速器LHC计划进行的高亮度升级期间,安装在CMS实验顶点和跟踪部分的位置敏感硅探测器将面临比现有系统设计更强的辐射环境。为了将跟踪器升级到所需的性能水平,已经进行了广泛的测量和模拟研究。利用Synopsys Sentaurus TCAD模拟软件包中的缺陷模型对质子辐照器件的体特性进行了模拟,模拟结果与硅条探测器的测量结果吻合较好。然而,由于通量增加的表面损伤,该模型没有提供预期的行为。该解决方案需要一种方法,该方法不影响质子模型产生的准确的本体性质,而只是在表面附近增加所需的辐射诱导性质。这些包括所观察到的条带检测器的电荷收集效率(CCE)的位置依赖性。在本文中,一个程序来找到一个缺陷模型,再现正确的CCE损失,以及其他表面性能的条探测器的注量$1.5\times10^{15}$ 1兆电子伏n $_{\textrm{eq}}$ cm $^{-2}$,将被提出。当在不同的注量与CCE损耗测量应用时,该方法可以提供用于参数化的氧化物电荷的积累在SiO2/Si界面作为剂量的函数的手段。

英文摘要:

During the scheduled high luminosity upgrade of LHC, the world's largest particle physics accelerator at CERN, the position sensitive silicon detectors installed in the vertex and tracking part of the CMS experiment will face more intense radiation environment than the present system was designed for. To upgrade the tracker to required performance level, extensive measurements and simulations studies have already been carried out. A defect model of Synopsys Sentaurus TCAD simulation package for the bulk properties of proton irradiated devices has been producing simulations closely matching with measurements of silicon strip detectors. However, the model does not provide expected behavior due to the fluence increased surface damage. The solution requires an approach that does not affect the accurate bulk properties produced by the proton model, but only adds to it the required radiation induced properties close to the surface. These include the observed position dependency of the strip detector's charge collection efficiency (CCE). In this paper a procedure to find a defect model that reproduces the correct CCE loss, along with other surface properties of a strip detector up to a fluence $1.5\times10^{15}$ 1 MeV n$_{\textrm{eq}}$ cm$^{-2}$, will be presented. When applied with CCE loss measurements at different fluences, this method may provide means for the parametrization of the accumulation of oxide charge at the SiO2/Si interface as a function of dose.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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