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arXiv 1111.5186cond-mat.mtrl-sci
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n型InN中的缺陷演化和相互作用

Defect evolution and interplay in n-type InN

Christian Rauch, Filip Tuomisto, Arantxa Vilalta-Clemente, Bertrand Lacroix, Pierre Ruterana, Simon Kraeusel, Ben Hourahine, William J. Schaff

摘要:

用正电子湮没谱和透射电子显微镜研究了自由载流子浓度高达6.6 × 10 ~(20)cm ~(-3)的n型Si掺杂InN外延层中本征点和扩展缺陷的性质和相互作用,并与未掺杂辐照薄膜的结果进行了比较。在Si掺杂样品中,V_In-V_N复合物是主要的III亚晶格空位缺陷。在界面处观察到更大的V_In-mV_N团簇的增强形成,这说明在近界面区域中高浓度的附加V_N,并且与该区域中螺型和刃型位错密度的增加相一致。

英文摘要:

The nature and interplay of intrinsic point and extended defects in n-type Si-doped InN epilayers with free carrier concentrations up to 6.6x10E20cm-3 are studied using positron annihilation spectroscopy and transmission electron microscopy and compared to results from undoped irradiated films. In as-grown Si-doped samples, V_In-V_N complexes are the dominant III-sublattice related vacancy defects. Enhanced formation of larger V_In-mV_N clusters is observed at the interface, which speaks for high concentrations of additional V_N in the near-interface region and coincides with an increase in the density of screw and edge type dislocations in that area.

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