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arXiv 0903.2837cond-mat.mes-hallcond-mat.mtrl-sci
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过渡金属在石墨烯上的电子掺杂和散射

Electronic Doping and Scattering by Transition Metals on Graphene

K. Pi, K. M. McCreary, W. Bao, Wei Han, Y. F. Chiang, Yan Li, S. -W. Tsai, C. N. Lau, R. K. Kawakami

摘要:

我们采用分子束外延结合原位输运测量的方法研究了过渡金属(TM)对石墨烯中电子掺杂和散射的影响。TM在石墨烯上的室温沉积产生掺杂n型的所有TM研究(Ti,Fe,Pt)的集群。我们还发现,TM团簇的散射表现出不同的行为相比,1/r库仑散射。在高覆盖率下,Pt膜能够产生n型或弱p型掺杂,这为理论预测的有利于n型掺杂的强界面偶极子提供了实验证据。

英文摘要:

We investigate the effects of transition metals (TM) on the electronic doping and scattering in graphene using molecular beam epitaxy combined with in situ transport measurements. The room temperature deposition of TM onto graphene produces clusters that dope n-type for all TM investigated (Ti, Fe, Pt). We also find that the scattering by TM clusters exhibits different behavior compared to 1/r Coulomb scattering. At high coverage, Pt films are able to produce doping that is either n-type or weakly p-type, which provides experimental evidence for a strong interfacial dipole favoring n-type doping as predicted theoretically.

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