石墨烯的扫描栅显微术：电荷不均匀性和非本征掺杂
Scanning Gate Microscopy on Graphene: Charge Inhomogeneity and Extrinsic Doping
摘要：
我们已经进行了扫描栅显微镜（SGM）的石墨烯场效应晶体管（GFET），使用偏置的金属纳米线涂有介电层作为接触模式的尖端和局部顶栅。在各种背栅电压下通过石墨烯的电传输被监测为尖端电压和尖端位置的函数。在狄拉克点附近，石墨烯电阻对尖端电压的依赖性显示出随尖端位置的显著变化。SGM成像揭示了电子掺杂和空穴掺杂区域的介观域。我们的测量表明，由于非本征局部掺杂，石墨烯中的载流子密度存在显著的空间波动（约为10^12/cm ^2）。在我们的样品中发现的这种掺杂的重要来源包括金属接触，石墨烯的边缘，结构缺陷和抗蚀剂残留物。
英文摘要：
We have performed scanning gate microscopy (SGM) on graphene field effect transistors (GFET), using a biased metallic nanowire coated with a dielectric layer as a contact mode tip and local top gate. Electrical transport through graphene at various back gate voltages is monitored as a function of tip voltage and tip position. Near the Dirac point, the dependence of graphene resistance on tip voltage shows a significant variation with tip position. SGM imaging reveals mesoscopic domains of electron-doped and hole-doped regions. Our measurements indicate a substantial spatial fluctuation (on the order of 10^12/cm^2) in the carrier density in graphene due to extrinsic local doping. Important sources for such doping found in our samples include metal contacts, edges of graphene, structural defects, and resist residues.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
