arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1602.08677cond-mat.mes-hall
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石墨烯中自发硼掺杂的机理和过程的理论研究

The mechanism and process of spontaneous boron doping in graphene in the theoretical perspective

Xiaohui Deng, Jing Zeng, Mingsu Si, Wei Lu

摘要:

提出了一个理论模型来揭示在微波等离子体实验中选择三甲基硼作为掺杂源(ACS NANO 6(2012)1970)将B掺杂到石墨烯中的机制。结果表明,硼掺杂的原因是三甲基硼分解出的C、H、CH、CH_2或CH_3等基团与硼的结合作用,掺杂过程经历了两个关键步骤。确定了第一步的最小能量路径。所考虑的情况下得到的能量势垒落在0.02-0.43 eV的范围内,支持的事实,即取代C的B可以很容易地实现,即使在室温下。第二步,通过H饱和去除垂直方向上的无关基团,最终实现B的完全掺杂。本工作成功地解释了上述实验现象,并针对石墨烯的硼掺杂提出了一种新颖可行的方法。

英文摘要:

A theoretical model is presented to reveal the mechanism of B doping into graphene in the microwave plasma experiment choosing trimethylboron as the doping source (ACS NANO 6 (2012) 1970). The results show that the reason for B doping comes from the combinational interaction of B and other groups (C, H, CH, CH2 or CH3) decomposing from trimethylboron and the doping undergoes two crucial steps. The minimal energy path for the first step are determined. The obtained energy barrier of considered cases fall into the range of 0.02-0.43 eV, supporting the fact that the substituting B for C can easily realized even at room temperature. As the second step, after removing irrelevant groups in vertical direction through H saturation, the perfect B doping is realized at last. This work successfully explain the above experimental phenomenon and propose a novel and feasible method aiming at B doping of graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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