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arXiv 1405.4264cond-mat.mtrl-scicond-mat.mes-hall
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缺陷石墨烯拉曼光谱的掺杂依赖性

Doping dependence of the Raman spectrum of defected graphene

M. Bruna, A. K. Ott, M. Ijas, D. Yoon, U. Sassi, A. C. Ferrari

摘要:

我们调查的拉曼光谱的缺陷作为掺杂的功能的演变。聚合物电解质门控允许我们移动费米能级高达0.7 eV,由\textit{in-situ}霍尔效应测量监测。对于一个给定的缺陷数,我们发现,D和D'峰的强度随掺杂的增加而降低。我们将此归因于光激发电子和空穴的总散射率增加,这是由于电子-电子散射的掺杂依赖强度。我们提出了一个一般的关系D峰强度和缺陷适用于任何掺杂水平

英文摘要:

We investigate the evolution of the Raman spectrum of defected graphene as a function of doping. Polymer electrolyte gating allows us to move the Fermi level up to 0.7eV, as monitored by \textit{in-situ} Hall-effect measurements. For a given number of defects, we find that the intensities of the D and D' peaks decrease with increasing doping. We assign this to an increased total scattering rate of the photoexcited electrons and holes, due to the doping-dependent strength of electron-electron scattering. We present a general relation between D peak intensity and defects valid for any doping level

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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