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arXiv 0903.2602cond-mat.mtrl-sci
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石墨烯中的缺陷散射

Defect scattering in graphene

Jian-Hao Chen, W. G. Cullen, C. Jang, M. S. Fuhrer, E. D. Williams

摘要:

通过500 eV的Ne和He离子照射SiO2上的石墨烯产生缺陷,该缺陷引起谷间散射,这从显著的拉曼D带强度中显而易见。缺陷散射给出与载流子密度成比例的电导率,其中迁移率随着离子剂量的倒数而减小。迁移率的下降是四倍以上的类似浓度的单电荷杂质。最小电导率与迁移率成比例地降低到低于4e^2/(pi*h)的值,这是石墨烯没有谷间散射的最小理论值。有缺陷的石墨烯在低温下显示出发散的电阻率,表明绝缘行为。结果是最好的解释离子诱导形成的晶格缺陷,导致在中间的间隙状态。

英文摘要:

Irradiation of graphene on SiO2 by 500 eV Ne and He ions creates defects that cause intervalley scattering as evident from a significant Raman D band intensity. The defect scattering gives a conductivity proportional to charge carrier density, with mobility decreasing as the inverse of the ion dose. The mobility decrease is four times larger than for a similar concentration of singly charged impurities. The minimum conductivity decreases proportional to the mobility to values lower than 4e^2/(pi*h), the minimum theoretical value for graphene free of intervalley scattering. Defected graphene shows a diverging resistivity at low temperature, indicating insulating behavior. The results are best explained by ion-induced formation of lattice defects that result in mid-gap states.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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