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arXiv 1111.0817cond-mat.mtrl-sci
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本征缺陷调控和衬底转移掺杂对石墨烯上外延Sb2Te3薄膜费米能级的调控

Fermi Level Tuning of Epitaxial Sb2Te3 Thin Films on Graphene by Regulating Intrinsic Defects and Substrate Transfer Doping

Yeping Jiang, Y. Y. Sun, Mu Chen, Yilin Wang, Zhi Li, Canli Song, Ke He, Lili Wang, Xi Chen, Qi-Kun Xue, Xucun Ma, S. B. Zhang

摘要:

采用分子束外延技术在石墨烯衬底上制备了高质量的Sb 2 Te 3薄膜,并利用原位扫描隧道显微镜/光谱仪对薄膜进行了研究。与第一性原理计算一致,确定了Sb 2 Te 3的本征缺陷是Sb空位和SbTe反位.通过最小化缺陷密度,再加上石墨烯衬底的转移掺杂,可以在体带隙的整个范围内调谐Sb 2 Te 3薄膜的费米能级。这为研究拓扑绝缘体在Dirac点附近的行为提供了必要条件。

英文摘要:

High-quality Sb2Te3 films are obtained by molecular beam epitaxy on graphene substrate and investigated by in situ scanning tunneling microscopy/spectroscopy. Intrinsic defects responsible for the natural p-type conductivity of Sb2Te3 are identified to be the Sb vacancies and SbTe antisites in agreement with first-principles calculations. By minimizing defect densities, coupled with a transfer doping by the graphene substrate, the Fermi level of Sb2Te3 thin films can be tuned over the entire range of the bulk band gap. This establishes the necessary condition to explore topological insulator behaviors near the Dirac point.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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