arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 1109.6907cond-mat.mtrl-sci
收藏

Silicon Carbide上准自由基石墨烯的掺杂起源

The Origin of Doping in Quasi-Free Standing Graphene on Silicon Carbide

J. Ristein, S. Mammadov, Th. Seyller

摘要:

我们解释了强大的p型掺杂观察准独立的石墨烯六方碳化硅衬底的自发极化。这种机制是基于SiC的体属性,不可避免的任何六边形多型体的材料和独立的界面形成的任何细节。我们表明,极化的符号和幅度与石墨烯层中观察到的掺杂水平完全一致。有了这种机制,基于假设的受体型缺陷的模型,因为他们讨论到目前为止是过时的。外延石墨烯的n型掺杂通常通过与缓冲层及其与衬底的界面相关联的施主样状态来解释,其过度补偿极化掺杂。

英文摘要:

We explain the robust p-type doping observed for quasi-free standing graphene on hexagonal silicon carbide by the spontaneous polarization of the substrate. This mechanism is based on a bulk property of SiC, unavoidable for any hexagonal polytype of the material and independent of any details of the interface formation. We show that sign and magnitude of the polarization are in perfect agreement with the doping level observed in the graphene layer. With this mechanism, models based on hypothetical acceptor-type defects as they are discussed so far are obsolete. The n-type doping of epitaxial graphene is explained conventionally by donor-like states associated with the buffer layer and its interface to the substrate which overcompensate the polarization doping.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑