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arXiv 2408.03044cond-mat.mtrl-sci

通过在外延 h-Lu1-xCaxMnO3 薄膜中掺杂 Ca 增强铁电结构畸变

Enhance Ferroelectric Structural Distortion via Doping Ca in Epitaxial h-Lu1-xCaxMnO3 Thin Films

Detian Yang, Yaohua Liu, Xiaoshan Xu

AI总结:

该研究在蓝宝石上利用 h-ScFeO3 缓冲层制备 Ca 掺杂 h-LuMnO3 外延薄膜,发现 x≥0.2 可消除界面钳制并增强铁电几何畸变。

摘要:

与本征铁电性不同,多铁性稀土锰氧化物 h-ReMnO3(Re=La–Lu、Y、Sc)薄膜中的非本征铁电性具有独特的几何畸变,并且在超薄极限下不受退极化场影响。本文通过掺杂 Ca,成功调控并增强了 h-LuMnO3 薄膜的铁电几何畸变。借助 h-ScFeO3 缓冲层,在蓝宝石衬底上稳定制备了处于压缩应变下的 h-Lu1-xCaxMnO3(x=0.1、0.2、0.3、0.4、0.5)外延薄膜。当掺杂浓度 x≥0.2 时,可消除通常由衬底诱导、抑制 h-ReMnO3 非本征铁电性的界面钳制效应。本工作建立了一种潜在的准二维铁电体系,并提出了一种增强六方锰氧化物非本征铁电性的普适应变工程方法。

英文摘要:

Unlike proper ferroelectricity, the improper ferroelectricity in multiferroic rare-earth manganites h-ReMnO3 (Re=La-Lu,Y,Sc) thin films features a unique geometric distortion and stays immune to the depolarizing field in the ultra-thin limit. Here, we have managed to tune and boost ferroelectric geometric distortion of h-LuMnO3 thin films by doping Ca. Compressively strained h-Lu1-xCaxMnO3(x=0.1,0.2,0.3,0.4,0.5)epitaxial thin films were stabilized over sapphire substrates by a h-ScFeO3 buffer layer. When the doping concentration x>=0.2, the common substrate-induced interface clamping effect that suppresses improper ferroelectricity of h-ReMnO3 can be eliminated. This work establishes a potential quasi-2D ferroelectric system and suggests a general strain engineering method to enhance improper ferroelectricity of hexagonal manganites.

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