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arXiv 2603.07902cond-mat.mes-hallphysics.app-ph
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设计用于低温应用的超低功耗拓扑晶体管:结合1T'-MoS2和HZO

Designing Extremely Low-Power Topological Transistors with 1T'-MoS2 and HZO for Cryogenic Applications

Incheon National University(仁川国立大学)

Yosep Park, Yungyeong Park, Hyeonseok Choi, Subeen Lim, Yeonghun Lee

AI总结:

本文提出了一种超低功耗的低温拓扑晶体管,通过结合1T'-MoS2拓扑通道和HZO铁电栅绝缘体,实现超陡转移曲线和低漏源电压下的高跨导,为大规模量子计算的低温电子接口提供高效解决方案。

摘要:

大规模量子计算需要低温电子控制器,如控制/读出电路和路由电路。然而,当前技术面临高功率耗散问题,阻碍了大规模量子位集成。本文理论提出了一种超低功耗的低温拓扑晶体管,即负电容拓扑绝缘体场效应晶体管(NC-TIFETs)。通过将门场诱导的二维1T'-二硫化钼(MoS$_2$)拓扑通道与氧化铪-锆(HZO)铁电栅绝缘体结合,NC-TIFETs表现出极陡的转移曲线和在低漏源电压($V_{\mathrm{D}}$)下的超高跨导。因此,NC-TIFETs是减少低温电子接口中功率耗散的有力候选,这对于大规模量子计算系统至关重要。

英文摘要:

Large-scale quantum computing requires cryogenic electronic controllers such as control/readout circuit and routing circuit. However, current technologies face high power dissipation problems, hindering large-scale qubit integration. Here, we theoretically propose extremely low-power cryogenic topological transistors, i.e., negative-capacitance topological insulator field-effect transistors (NC-TIFETs). By combining a gate-field-induced two-dimensional 1T'-Molybdenum Disulfide (MoS$_2$) topological channel with a hafnium-zirconium oxide (HZO) ferroelectric gate insulator, NC-TIFETs exhibit an extremely steep-slope transfer curve and ultra-high transconductance at low drain voltage ($V_{\mathrm{D}}$). Therefore, NC-TIFETs are the compelling candidate for minimizing power dissipation in the cryogenic electronic interfaces essential for large-scale quantum computing systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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