深低温下背栅WS$_2$晶体管中的多分支输运
Multi-Branch Transport in a Back-gated WS$_2$ Transistor at Deep-Cryogenic Temperature
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中文总结 AI 辅助
该研究在深低温(20 mK)下表征背栅多层WS$_2$晶体管,发现其保持强栅极可调性(开关比>10^5),并观察到可重复的肩状开启特征,通过多有效导电分支并联的唯象模型加以解释。
中文摘要 AI 辅助
二维材料是超越传统半导体技术工作极限的电子应用的有前景候选材料。在这一类材料中,过渡金属二硫属化物为场效应晶体管工作提供了有吸引力的特性,其中二硫化钨(WS$_2$)成为在低温下工作的特别有前景的材料。在这里,我们研究了在深低温(低至20 mK)下背栅多层WS$_2$晶体管的电学性能。该器件在整个低温范围内保持强栅极可调性,有效开关电流比超过$10^{5}$。最值得注意的是,低温开启特性表现出可重复的肩状特征,我们使用一个包含多个并联工作的有效导电分支的唯象模型来描述这些特征。
英文摘要
Two-dimensional materials are promising candidates for electronic applications beyond the operating limits of conventional semiconductor technologies. Within this class, transition-metal dichalcogenides offer attractive properties for field-effect transistor operation, with tungsten disulphide (WS$_2$) emerging as a particularly promising material for operation at cryogenic temperatures. Here, we investigate the electrical performance of a back-gated multilayer WS$_2$ transistor at deep cryogenic temperature, down to 20 mK. The device remains strongly gate-tunable throughout the cryogenic regime, with an effective on/off current ratio exceeding $10^{5}$. Most notably, the low-temperature turn-on characteristics exhibit reproducible shoulder-like features, which we describe using a phenomenological model comprising multiple effective conduction branches operating in parallel.
发表机构
- University of Strathclyde(斯特拉斯克莱德大学)
- Tyndall National Institute, University College Cork(科克大学廷德尔国家研究所)
- School of Chemistry, University College Cork(科克大学化学学院)
- National Physical Laboratory(英国国家物理实验室)
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