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arXiv 2203.01036physics.ins-det
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硅电子倍增传感器

The Silicon Electron Multiplier Sensor

Marius Mæhlum Halvorsen, Victor Coco, Evangelos Leonidas Gkougkousis, Paula Collins, Olivier Girard

摘要:

硅电子倍增器(SiEM)是一种用于最小电离粒子(MIP)检测的新型传感器概念,它使用内部增益和精细间距来实现出色的时间和空间分辨率。与增益区由掺杂引起的传感器(LGAD、APD)相比,SiEM中的放大是通过使用MEMS制造技术在嵌入硅块体内的复合电极结构中施加电势差来实现的。由于预期在辐射损伤的情况下没有增益层失活,因此预期这种结构能够承受高达$10^{16} n_{eq}$的注量。各种几何形状和偏置配置进行了研究,所考虑的制造工艺所施加的边界内。研究了在$6 - 15 μm$范围内单元尺寸的有效增益、传感器中的场、漏电流和击穿条件。模拟结果表明,增益超过10可以实现,和研究的时间结构的感应信号从电荷云沉积在传感器的中间显示,类似于其他传感器的时间分辨率与内部增益可以预期。计划的概念验证传感器的制造和随后的表征进行了讨论。

英文摘要:

The Silicon Electron Multiplier (SiEM) is a novel sensor concept for minimum ionizing particle (MIP) detection which uses internal gain and fine pitch to achieve excellent temporal and spatial resolution. In contrast to sensors where the gain region is induced by doping (LGADs, APDs), amplification in the SiEM is achieved by applying an electric potential difference in a composite electrode structure embedded within the silicon bulk using MEMS fabrication techniques. Since no gain-layer deactivation is expected with radiation damage, such a structure is expected to withstand fluences of up to $10^{16} n_{eq}$. Various geometries and biasing configurations are studied, within the boundaries imposed by the fabrication process being considered. The effective gain, the field in the sensor, the leakage current and breakdown conditions are studied for cell sizes in the range of $6 - 15 μm$. Simulations show that gains in excess of 10 can be achieved, and studies of the time structure of the induced signals from a charge cloud deposited in the middle of the sensor show that time resolutions similar to other sensors with internal gain can be expected. Plans for the manufacture of a proof-of-concept sensor and for its subsequent characterisation are discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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