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arXiv 2201.00211cond-mat.mtrl-sci
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温度对半导体缺陷电荷态跃迁能级的影响

Temperature Effect on Charge-state Transition Levels of Defects in Semiconductors

Shuang Qiao, Yu-Ning Wu, Xiaolan Yan, Bartomeu Monserrat, Su-Huai Wei, Bing Huang

摘要:

缺陷在决定半导体的整体物理性质方面至关重要。通常,电荷态跃迁能级(TEL)是决定半导体中缺陷可掺杂性的关键物理量之一,其与温度有关。然而,我们对TEL的温度依赖性知之甚少,因此,几乎所有现有的半导体缺陷理论都建立在温度无关近似的基础上。本文通过推导热致发光温度依赖性的基本公式,建立了半导体热致发光温度依赖性的两个基本规律。基于这些规则,令人惊讶的是,发现不同缺陷的TEL的温度依赖性是相当不同的:它可以变得更浅,更深,或保持不变。这种缺陷特异性行为主要由自由能校正(由电荷状态转变期间缺陷周围的局部体积变化确定)和带边变化(其对于不同半导体不同)之间的协同或相反效应确定。这些基本公式和规则,通过大量的国家的最先进的温度依赖性的缺陷计算在GAN中证实,可能会被广泛采用的理解或优化在有限温度下的半导体掺杂行为的指导方针。

英文摘要:

Defects are crucial in determining the overall physical properties of semiconductors. Generally, the charge-state transition level (TEL), one of the key physical quantities that determines the dopability of defects in semiconductors, is temperature dependent. However, little is known about the temperature dependence of TEL, and, as a result, almost all existing defect theories in semiconductors are built on a temperature-independent approximation. In this article, by deriving the basic formulas for temperature-dependent TEL, we have established two fundamental rules for the temperature dependence of TEL in semiconductors. Based on these rules, surprisingly, it is found that the temperature dependences of TEL for different defects are rather diverse: it can become shallower, deeper, or stay unchanged. This defect-specific behavior is mainly determined by the synergistic or opposing effects between free energy corrections (determined by the local volume change around the defect during a charge-state transition) and band edge changes (which differ for different semiconductors). These basic formulas and rules, confirmed by a large number of state-of-the-art temperature-dependent defect calculations in GaN, may potentially be widely adopted as guidelines for understanding or optimizing doping behaviors in semiconductors at finite temperatures.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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