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arXiv cond-mat/0010342cond-mat.mtrl-sci
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III-V半导体表面的点缺陷

Point defects on III-V semiconductor surfaces

G. Schwarz, J. Neugebauer, M. Scheffler

摘要:

用密度泛函理论计算了GaAs、GaP和InP(110)面上点缺陷的基本性质(原子几何形状、电荷转移能级位置和形成能)。基于这些结果,我们讨论了表面缺陷的电子特性,缺陷偏析,和补偿。

英文摘要:

The basic properties of point defects (atomic geometry, the position of charge-transfer levels, and formation energies) on the (110) surface of GaAs, GaP, and InP have been calculated employing density-functional theory. Based on these results we discuss the electronic properties of surface defects, defect segregation, and compensation.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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