arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 0906.4495cond-mat.mtrl-sci
收藏

层状半导体中缺陷引起的刚性增强

Defect induced rigidity enhancement in layered semiconductors

Zs. Rak, S. D. Mahanti, K. C. Mandal, N. C. Fernelius

摘要:

我们讨论的机制,负责观察到的改善In掺杂的GaSe,一个层状材料的结构特性的巨大电流的兴趣。形成能的计算表明,通过调节费米能级,In可以取代Ga或作为间隙带电缺陷$(\text{In}_{\text{i}}^{\text{3+}})$存在。我们发现,$\text{In}_{\text{i}}^{\text{3+}}$显着地增加了GaSe的剪切刚度,解释了所观察到的In掺杂的p-GaSe的刚度的增强。这里讨论的刚度增强的机制是相当普遍的,适用于一大类层间结合较弱的层状固体。

英文摘要:

We discuss the mechanism responsible for the observed improvement in the structural properties of In doped GaSe, a layered material of great current interest. Formation energy calculations show that by tuning the Fermi energy, In can substitute for Ga or can go as an interstitial charged defect$(\text{In}_{\text{i}}^{\text{3+}})$. We find that $\text{In}_{\text{i}}^{\text{3+}}$ dramatically increases the shear stiffness of GaSe, explaining the observed enhancement in the rigidity of In doped p-GaSe. The mechanism responsible for rigidity enhancement discussed here is quite general and applicable to a large class of layered solids with weak interlayer bonding.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑