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arXiv 2107.05014cond-mat.mtrl-scicond-mat.mes-hall
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层状半导体InSe中位错结构和迁移率的第一性原理研究

Dislocation structure and mobility in the layered semiconductor InSe: A first-principles study

A. N. Rudenko, M. I. Katsnelson, Yu. N. Gornostyrev

摘要:

基于广义Peierls-Nabarro模型和第一性原理导出的材料参数化方法,采用多尺度方法研究了层状半导体InSe中位错的结构和迁移率. InSe的塑性归因于层间位错滑移的广义层错弛豫的特殊性,例如具有非常低能量和低能量势垒的层错的存在。我们的结果给出了最近观察到的InSe异常可塑性的一致的微观解释[Science { \bf 369},542(2020)]。

英文摘要:

The structure and mobility of dislocations in the layered semiconductor InSe is studied within a multiscale approach based on generalized Peierls--Nabarro model with material-specific parametrization derived from first principles. The plasticity of InSe turns out to be attributed to peculiarities of the generalized stacking fault relief for the interlayer dislocation slips such as existence of the stacking fault with a very low energy and low energy barriers. Our results give a consistent microscopic explanation of recently observed [Science {\bf 369}, 542 (2020)] exceptional plasticity of InSe.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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