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arXiv 0810.5048cond-mat.mtrl-sci
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Cr掺杂AlN稀磁半导体的氮缺陷和铁磁性的第一性原理研究

Nitrogen defects and ferromagnetism of Cr-doped AlN diluted magnetic semiconductor from first principles

Li-Jie Shi, Li-Fang Zhu, Yong-Hong Zhao, Bang-Gui Liu

摘要:

报道了用各种方法制备的Cr掺杂AlN稀磁半导体的居里温度高达900 K,这对于自旋电子学应用是令人兴奋的。据认为,N缺陷在实现良好样品的高温铁磁性方面起着重要作用。基于这些实验进展,我们采用全势密度泛函理论和超原胞方法研究了N缺陷对含N空位(VN)的(Al,Cr)N铁磁性的影响。计算结果与实验观察和实际掺铬AlN样品及其合成的事实相一致。我们的第一性原理研究结果对于阐明铁磁性的形成机制和开发高性能的掺铬AlN稀磁半导体材料具有重要意义。

英文摘要:

High Curie temperature of 900 K has been reported in Cr-doped AlN diluted magnetic semiconductors prepared by various methods, which is exciting for spintronic applications. It is believed that N defects play important roles in achieving the high temperature ferromagnetism in good samples. Motivated by these experimental advances, we use a full-potential density-functional-theory method and supercell approach to investigate N defects and their effects on ferromagnetism of (Al,Cr)N with N vacancies (V_N). Calculated results are in agreement with experimental observations and facts of real Cr-doped AlN samples and their synthesis. Our first-principles results are useful to elucidating the mechanism for the ferromagnetism and exploring high-performance Cr-doped AlN diluted magnetic semiconductors.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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