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arXiv 2012.04465cond-mat.mtrl-sci
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表面扩散控制在区域选择性原子层沉积中实现定制的纵横比纳米结构

Surface Diffusion Control Enables Tailored Aspect Ratio Nanostructures in Area-Selective Atomic Layer Deposition

Philip Klement, Daniel Anders, Lukas Gümbel, Michele Bastianello, Fabian Michel, Jörg Schörmann, Matthias T. Elm, Christian Heiliger, Sangam Chatterjee

摘要:

区域选择性原子层沉积是现代微电子学的关键技术,因为它通过仅在特定区域中实现材料沉积来消除传统方法固有的对准误差。通常,选择性源自允许或阻止前体吸附的基底的表面改性。沉积过程的控制目前仍然是一个主要的挑战,因为非生长区域的选择性迅速丧失。在这里,我们表明,衬底的表面改性强烈操纵表面扩散。TiO $_2$在聚甲基丙烯酸甲酯和SiO $_2$上的选择性沉积产生具有定制纵横比的局部纳米结构。控制表面扩散允许调整这样的纳米结构,因为它提高了生长区域和非生长区域的界面处的生长速率。动力学Monte-Carlo计算表明,物种从高扩散区向低扩散区移动。此外,我们确定的催化活性的TiCl $_4$在聚(甲基丙烯酸甲酯)上的羧酸形成的反应机制负责的损失的选择性,并表明,工艺优化导致更高的选择性。我们的工作使得精确控制区域选择性原子层沉积在纳米尺度上,并提供了新的策略,在区域选择性沉积过程中,通过利用表面扩散效应。

英文摘要:

Area-selective atomic layer deposition is a key technology for modern microelectronics as it eliminates alignment errors inherent to conventional approaches by enabling material deposition only in specific areas. Typically, the selectivity originates from surface modifications of the substrate that allow or block precursor adsorption. The control of the deposition process currently remains a major challenge as the selectivity of the no-growth areas is lost quickly. Here, we show that surface modifications of the substrate strongly manipulate the surface diffusion. The selective deposition of TiO$_2$ on poly (methyl methacrylate) and SiO$_2$ yields localized nanostructures with tailored aspect ratios. Controlling the surface diffusion allows to tune such nanostructures as it boosts the growth rate at the interface of the growth and no-growth areas. Kinetic Monte-Carlo calculations reveal that species move from high to low diffusion areas. Further, we identify the catalytic activity of TiCl$_4$ during the formation of carboxylic acid on poly (methyl methacrylate) as the reaction mechanism responsible for the loss of selectivity, and show that process optimization leads to higher selectivity. Our work enables the precise control of area-selective atomic layer deposition on the nanoscale, and offers new strategies in area-selective deposition processes by exploiting surface diffusion effects.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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