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arXiv 0809.1548cond-mat.mtrl-sci
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改进的平行电子束诱导沉积金属纳米结构阵列

Modified Electron Beam Induced Deposition of Metal Nanostructure Arrays using a Parallel Electron Beam

Joysurya Basu, C. Barry Carter, R. Divakar, Vijay B. Shenoy, N. Ravishankar

摘要:

提出了一种改进的平行电子束诱导沉积方法。该方法依赖于暴露于电子束的绝缘表面上的表面电势的建立。绝缘表面上锐边的存在意味着大电场的存在,其导致金属蒸气在这些区域上的位点特异性成核。可以沉积小至20 nm的特征尺寸,而不需要使用精细探针,从而克服了探针尺寸对分辨率的限制。纯金属蒸汽的使用也使该工艺本身清洁。

英文摘要:

A modified electron beam induced deposition method using a parallel beam of electrons is developed. The method relies on the build-up of surface potential on an insulating surface exposed to an electron beam. Presence of sharp edges on the insulating surface implies presence of large electric fields that lead to site-specific nucleation of metal vapor on those regions. Feature sizes as small as 20 nm can be deposited without the need to use fine probes and thus the limitation of probe size imposed on the resolution is overcome. The use of pure metal vapor also renders the process inherently clean.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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