聚焦电子束诱导沉积Co纳米结构的生长后纯化
Post-growth purification of Co nanostructures prepared by focused electron beam induced deposition
摘要：
在大多数情况下，采用有机金属前体通过聚焦电子束诱导沉积（FEBID）制备的纳米结构主要含有碳基配体解离产物。这对于使用这种高分辨率直接写入方法来制备用于各种领域的纳米结构是不幸的，所述领域例如介观物理学、微磁性、电子相关性、自旋相关传输和许多应用。在这里，我们提出了一种原位清洗方法，以获得纯Co-FEBID纳米结构。纯化过程在于将加热的样品暴露于H $_2$气氛中，并结合低能电子的照射。关键的发现是，在$300^\circ$ C，H $_2$暴露和电子辐照下退火的组合导致从沉积的Co-FEBID结构开始的厚度低至约20 nm的致密的、无碳和氧的Co层。除此之外，在后处理样品的温度依赖性电阻测量中，我们发现了典型的金属行为。在低温磁电阻和霍尔效应测量中，我们观察到铁磁行为。
英文摘要：
In the majority of cases nanostructures prepared by focused electron beam induced deposition (FEBID) employing an organometallic precursor contain predominantly carbon-based ligand dissociation products. This is unfortunate with regard to using this high-resolution direct-write approach for the preparation of nanostructures for various fields, such as mesoscopic physics, micromagnetism, electronic correlations, spin-dependent transport and numerous applications. Here we present an in-situ cleaning approach to obtain pure Co-FEBID nanostructures. The purification procedure lies in the exposure of heated samples to a H$_2$ atmosphere in conjunction with the irradiation by low-energy electrons. The key finding is that the combination of annealing at $300^\circ$C, H$_2$ exposure and electron irradiation leads to compact, carbon- and oxygen free Co layers down to a thickness of about 20\,nm starting from as-deposited Co-FEBID structures. In addition to this, in temperature-dependent electrical resistance measurements on post-processed samples we find a typical metallic behavior. In low-temperature magneto-resistance and Hall effect measurements we observe ferromagnetic behavior.
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