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arXiv 2104.10293cond-mat.mtrl-scicond-mat.mes-hall
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用于3D磁性结构的钇铁石榴石薄膜的原子层沉积

Atomic Layer Deposition of Yttrium Iron Garnet Thin Films for 3D Magnetic Structures

M. Lammel, D. Scheffler, D. Pohl, P. Swekis, S. Reitzig, H. Reichlova, R. Schlitz, K. Geishendorf, L. Siegl, B. Rellinghaus, L. M. Eng, K. Nielsch, S. T. B. Goennenwein, A. Thomas

AI总结:

本研究首次通过原子层沉积技术,利用超循环方法结合Fe₂O₃和Y₂O₃二元层并退火,成功制备了高质量YIG薄膜,为三维磁性纳米结构的实验研究提供了理想方法。

摘要:

已有研究预测,在三维磁性纳米结构中会出现诸如新型磁化构型等广泛的新现象。然而,由于所需的特定形状(如磁性管和螺旋),这类结构的制备通常具有挑战性。此外,目前用于组装这些结构的材料主要是磁性金属,无法将系统的磁响应与电子响应分开研究。在自旋电子学领域,用于此类实验的典型材料是亚铁磁绝缘体钇铁石榴石(Y$_3$Fe$_5$O$_{12}$, YIG)。由于其低Gilbert阻尼,YIG是最佳材料之一,尤其适用于磁子学研究。在此,我们报告了通过原子层沉积首次成功制备YIG薄膜。为此,我们在Y$_3$Al$_5$O$_{12}$衬底上采用超循环方法,以正确的原子比例组合Fe$_2$O$_3$和Y$_2$O$_3$二元系统的亚纳米薄层,并进行后续退火处理。该工艺对典型的生长相关偏差具有鲁棒性,确保了良好的可重复性。ALD-YIG薄膜展现出良好的晶体质量,且磁性可与其他沉积技术相媲美。原子层沉积的突出特点之一是能够保形涂覆任意形状的衬底。因此,ALD是赋予磁性系统形状选择广泛自由度的理想沉积技术。YIG的原子层沉积实现了新型三维磁性纳米结构的制备,进而可用于实验研究这些结构中预测的现象。

英文摘要:

A wide variety of new phenomena such as novel magnetization configurations have been predicted to occur in three dimensional magnetic nanostructures. However, the fabrication of such structures is often challenging due to the specific shapes required, such as magnetic tubes and spirals. Furthermore, the materials currently used to assemble these structures are predominantly magnetic metals that do not allow to study the magnetic response of the system separately from the electronic one. In the field of spintronics, the prototypical material used for such experiments is the ferrimagnetic insulator yttrium iron garnet (Y$_3$Fe$_5$O$_{12}$, YIG). YIG is one of the best materials especially for magnonic studies due to its low Gilbert damping. Here, we report the first successful fabrication of YIG thin films via atomic layer deposition. To that end we utilize a supercycle approach based on the combination of sub-nanometer thin layers of the binary systems Fe$_2$O$_3$ and Y$_2$O$_3$ in the correct atomic ratio on Y$_3$Al$_5$O$_{12}$ substrates with a subsequent annealing step. Our process is robust against typical growth-related deviations, ensuring a good reproducibility. The ALD-YIG thin films exhibit a good crystalline quality as well as magnetic properties comparable to other deposition techniques. One of the outstanding characteristics of atomic layer deposition is its ability to conformally coat arbitrarily-shaped substrates. ALD hence is the ideal deposition technique to grant an extensive freedom in choosing the shape of the magnetic system. The atomic layer deposition of YIG enables the fabrication of novel three dimensional magnetic nanostructures, which in turn can be utilized for experimentally investigating the phenomena predicted in those structures.

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