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arXiv 1804.09792physics.ins-det
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SiPMs中子辐照损伤的诱导退火技术

An induced annealing technique for SiPMs neutron radiation damage

M. Cordelli, E. Diociaiuti, A. Ferrari, S. Miscetti, S. Muller, G. Pezzullo, I. Sarra

摘要:

硅光电倍增器(SiPMs)在高能物理实验装置的设计中已变得流行,并且在提供大量非电离剂量的探测器领域中的应用越来越受到关注。对于这些装置,由中子注量引起的主要效应是泄漏电流的线性增加。在本文中,我们提出了一种技术,提供了一个部分恢复的中子损伤SiPM的电诱导退火的装置。在20 ℃的温度下,对具有50 μ m像素尺寸的6 mm^2电池的三个SiPM阵列(2x 3)的样品进行测试:两个来自Hamamatsu,一个来自SensL。这些SiPM已经暴露在易北河正电子源设施(德累斯顿)产生的中子中,总通量高达8 × 10^11 n1 MeV-eq/cm^2。我们的技术可以减少泄漏电流的一个因素,范围在15-20之间,这取决于所使用的过偏置和SiPM供应商。因为在工艺期间SiPM电流可达到O(100 mA),所以传感器需要在提供热耗散的条件下操作。事实上,在SiPM上应用这种程序时必须谨慎,因为它可能会永久损坏设备本身。

英文摘要:

The use of Silicon Photo-Multipliers(SiPMs)has become popular in the design of High Energy Physics experimental apparatus with a growing interest for their application in detector area where a significant amount of non-ionising dose is delivered. For these devices, the main effect caused by the neutron fluence is a linear increase of the leakage current. In this paper, we present a technique that provides a partial recovery of the neutron damage on SiPMs by means of an Electrical Induced Annealing. Tests were performed, at the temperature of 20C, on a sample of three SiPM arrays (2x3) of 6 mm^2 cells with 50 um pixel sizes: two from Hamamatsu and one from SensL. These SiPMs have been exposed to neutrons generated by the Elbe Positron Source facility (Dresden), up to a total fluence of 8x10^11 n1MeV-eq/cm^2. Our techniques allowed to reduced the leakage current of a factor ranging between 15-20 depending on the overbias used and the SiPM vendor. Because, during the process the SiPM current can reach O(100 mA), the sensors need to be operated in a condition that provides thermal dissipation. Indeed, caution must be used when applying this kind of procedures on the SiPMs, because it may damage permanently the device itself.

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