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arXiv 0907.3050physics.ins-dethep-ex
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对硅探测器损伤特性有重要影响的辐照感生点缺陷和与晶体有关的缺陷

Radiation Induced Point and Cluster-Related Defects with Strong Impact to Damage Properties of Silicon Detectors

Ioana Pintiliea, Gunnar Lindstroem, Alexandra Junkes, Eckhart Fretwurst

摘要:

这项工作的重点是辐射引起的缺陷负责硅探测器的退化的调查。通过对60Co射线、6和15MeV电子、23GeV质子和1MeV等效反应堆中子辐照引起的缺陷的比较研究,发现点缺陷和团簇中心的存在对Si二极管的损伤特性有很大影响。基于缺陷分析的微观原因和它们对探测器性能的宏观后果之间的详细关系。特别是,它表明,暴露于高水平的60 Co剂量后的Si器件性能的变化可以完全理解的两个点缺陷的形成,都强烈依赖于在硅体中的氧浓度。强子辐照的特殊性是退火效应,退火效应分别降低。增加了最初观察到的损伤效应,如耗尽电压的变化所示。一组三个集群相关的缺陷,显示为深孔陷阱,被证明是负责具体的反向退火。它们的形成不受氧含量或Si生长过程的影响,这表明它们是位于扩展的无序区域内的多空位的复合物。

英文摘要:

This work focuses on the investigation of radiation induced defects responsible for the degradation of silicon detectors. Comparative studies of the defects induced by irradiation with 60Co- rays, 6 and 15 MeV electrons, 23 GeV protons and 1 MeV equivalent reactor neutrons revealed the existence of point defects and cluster related centers having a strong impact on damage properties of Si diodes. The detailed relation between the microscopic reasons as based on defect analysis and their macroscopic consequences for detector performance are presented. In particular, it is shown that the changes in the Si device properties after exposure to high levels of 60Co- doses can be completely understood by the formation of two point defects, both depending strongly on the Oxygen concentration in the silicon bulk. Specific for hadron irradiation are the annealing effects which decrease resp. increase the originally observed damage effects as seen by the changes of the depletion voltage. A group of three cluster related defects, revealed as deep hole traps, proved to be responsible specifically for the reverse annealing. Their formation is not affected by the Oxygen content or Si growth procedure suggesting that they are complexes of multi-vacancies located inside extended disordered regions.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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