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arXiv physics/0211118physics.ins-det
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硅探测器的强子和电磁辐照损伤

Radiation Damage in Silicon Detectors Caused by Hadronic and Electromagnetic Irradiation

E. Fretwurst, G. Lindstrom, I. Pintilie, J. Stahl

摘要:

该报告载有硅探测器受到高强度强子和电磁辐射后受到辐射损害的各个方面。它的重点是改进预见的LHC应用,采用氧化硅晶片在探测器处理(结果从CERN-RD 48)。第一篇文章介绍了强子损伤的最新研究进展。几个改进概述,特别是相对于与探测器存储在LHC维护期间的抗退火问题。在最后一节中概述了开放的问题,其中包括充分了解质子和中子引起的损伤之间的差异,过程相关的影响,改变辐射耐受性,除了氧含量和缺乏了解的基础上,损伤引起的点和集群缺陷的探测器性能的变化。除了浮区硅,到目前为止完全用于探测器的制造,直拉硅也进行了研究,并首次显示有希望的结果。其他三篇论文处理伽马引起的损害,包括也引入缺陷的处理步骤或固有的生长硅。然而,重点是在宽剂量范围内的伽马辐照后的测量。研究了探测器性能和缺陷特性的变化。对于第一次,它表明,在一个标准的过程中,氧化硅探测器承受的辐射剂量高达1梯度只有轻微的恶化。此外,它是第一次示出,在这种情况下,检测器的性能可以直接解释由损伤引起的点缺陷。这种1:1的相关性对于所有未来的缺陷工程工作都是非常有希望的。

英文摘要:

The report contains various aspects of radiation damage in silicon detectors subjected to high intensity hadron and electromagnetic irradiation. It focuses on improvements for the foreseen LHC applications, employing oxygenation of silicon wafers during detector processing (result from CERN-RD48). An updated survey on hadron induced damage is given in the first article. Several improvements are outlined especially with respect to antiannealing problems associated with detector storage during LHC maintenance periods. Open questions are outlined in the final section, among which are a full understanding of differences found between proton and neutron induced damage, process related effects changing the radiation tolerance in addition to the oxygen content and the lack of understanding the changed detector properties on the basis of damage induced point and cluster defects. In addition to float zone silicon, so far entirely used for detector fabrication,Czochralski silicon was also studied and first promising results are shown. The other three papers deal with gamma induced damage including also defects introduced either by processing steps or being inherent to the as grown silicon. However the focus is on measurements after gamma irradiation in a wide dose range. Both the changes in detector properties and defect characterisations have been studied. For the first time it is shown that in contrast to a standard process oxygenated silicon detectors withstand an irradiation dose of up to 1 Grad with only minor deterioration. Also it is shown for the first time that in this case the detector properties can directly be explained by the damage induced point defects. This 1:1 correlation is extremely promising for all future defect engineering work.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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