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arXiv 1803.06950physics.ins-detcond-mat.mtrl-sci
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辐照损伤硅中点缺陷和团缺陷的研究

Study of point- and cluster-defects in radiation-damaged silicon

Elena M. Donegani, Eckhart Fretwurst, Erika Garutti, Robert Klanner, Gunnar Lindstroem, Ioana Pintilie, Roxana Radu, Joern Schwandt

摘要:

辐射的非电离能量损失在硅中产生点缺陷和缺陷团,这导致传感器性能的显著下降。在这篇文章中,给出了在80~280 ° C等时退火条件下,几个$10^{14}$ cm $^{-2}$注量和3.5~27 MeV能量的电子辐照硅焊盘二极管的TSC(热激电流)缺陷谱结果。介绍了一种基于SRH(Shockley-Read-Hall)统计的方法,该方法假设团簇中缺陷的电离能取决于被占据的陷阱的分数。从TSC数据中提取了孤立点缺陷和完全占据的团簇的电离能差$ΔE_a$。对于VOi(vacancy-oxygen interstitial)缺陷,发现了$ΔE_a = 0$,证实了它是一个点缺陷,验证了点缺陷的方法。对于由深受主制成的团簇,在80 ° C退火后确定不同缺陷的$ΔE_a$值作为电子能量的函数,并且对于用15 MeV电子照射作为退火温度的函数。对于用3.5 MeV电子的辐照,发现值$ΔE_a = 0$,而对于6至27 MeV $ΔE_a > 0$的电子能量。这与电子形成团簇形成的预期阈值约为5 MeV一致。作为退火温度的函数确定的$ΔE_a$值表明,对于不同的缺陷,退火速率是不同的。一个朴素的扩散模型是用来估计的温度依赖性的集群中的缺陷的扩散。

英文摘要:

Non-ionising energy loss of radiation produces point defects and defect clusters in silicon, which result in a signifcant degradation of sensor performance. In this contribution results from TSC (Thermally Stimulated Current) defect spectroscopy for silicon pad diodes irradiated by electrons to fluences of a few $10^{14}$ cm$^{-2}$ and energies between 3.5 and 27 MeV for isochronal annealing between 80 and 280°C, are presented. A method based on SRH (Shockley-Read-Hall) statistics is introduced, which assumes that the ionisation energy of the defects in a cluster depends on the fraction of occupied traps. The dfference of ionisation energy of an isolated point defect and a fully occupied cluster, $ΔE_a$, is extracted from the TSC data. For the VOi (vacancy-oxygen interstitial) defect $ΔE_a = 0$ is found, which cofirms that it is a point defect, and validates the method for point defects. For clusters made of deep acceptors the $ΔE_a$ values for different defects are determined after annealing at 80°C as a function of electron energy, and for the irradiation with 15 MeV electrons as a function of annealing temperature. For the irradiation with 3.5 MeV electrons the value $ΔE_a = 0$ is found, whereas for the electron energies of 6 to 27 MeV $ΔE_a > 0$. This agrees with the expected threshold of about 5 MeV for cluster formation by electrons. The $ΔE_a$ values determined as a function of annealing temperature show that the annealing rate is different for different defects. A naive diffusion model is used to estimate the temperature dependencies of the diffusion of the defects in the clusters.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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