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arXiv 1804.03338physics.ins-det
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用浮区硅研制集成型绝缘体上硅单片像素探测器

Development of Integration-Type Silicon-On-Insulator Monolithic Pixel Detectors by Using a Float Zone Silicon

S. Mitsui, Y. Arai, T. Miyoshi, A. Takeda

摘要:

在本文中,我们描述了单片像素探测器的发展,通过使用硅绝缘体(SOI)技术的X射线和带电粒子的应用。探测器基于0.2 μ mCMOS全耗尽SOI工艺(Lapis Semiconductor Co.,有限公司)。SOI晶片由用于传感的厚的高电阻率衬底和用于CMOS电路的薄的低电阻率Si层组成。我们开发了集成型SOI像素探测器INTPIX 4,主要用于X射线成像;它由浮区(FZ)或直拉(Cz)硅片制成。自2005年以来,Cz SOI探测器首次使用。2011年后,FZ SOI探测器成功制造。本文叙述了用FZ硅制作SOI单片像素探测器的最新进展和测试结果,并与用CZ硅制作的结果进行了比较。

英文摘要:

In this paper, we describe the development of monolithic pixel detectors by using a Silicon-on-Insulator (SOI) technology for X-ray and charged particle applications. The detectors are based on a 0.2 μm CMOS fully depleted SOI process (Lapis Semiconductor Co., Ltd). The SOI wafer consists of a thick high-resistivity substrate for sensing and a thin low resistivity Si layer for CMOS circuits. We developed the integration-type SOI pixel detector, INTPIX4 mainly for X-ray imaging; it is made of a Float Zone (FZ) or Czochralski (Cz) silicon wafer. Since 2005, Cz SOI detectors were used initially. After 2011, FZ SOI detectors were successfully fabricated. In this paper, we state recent progresses and test results of the SOI monolithic pixel detector using a FZ silicon and compare them with the results obtained using the Cz detector.

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