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arXiv 1609.00701cond-mat.mes-hall
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高频、缩放MoS2晶体管

High-frequency, scaled MoS2 transistors

Daria Krasnozhon, Subhojit Dutta, Clemens Nyffeler, Yusuf Leblebici, Andras Kis

摘要:

最近,对用于射频(RF)应用的MoS2的兴趣有所增加。然而,对用于RF应用的由MoS2制成的晶体管的缩放行为知之甚少,这对于建立基于柔性和刚性衬底上的2D半导体的电子电路的性能限制很重要。在这里,我们提出了一个系统的研究顶部栅控三层二硫化钼RF晶体管的栅极长度缩小到70和40纳米。此外,通过在三层MoS2器件中引入边缘接触电子注入,我们降低了接触电阻,并因此在去嵌入过程之前获得了6 GHz的最高截止频率,在去嵌入过程之后获得了25 GHz的最高截止频率。

英文摘要:

The interest in MoS2 for radio-frequency (RF) application has recently increased. However, little is known on the scaling behavior of transistors made from MoS2 for RF applications, which is important for establishing performance limits for electronic circuits based on 2D semiconductors on flexible and rigid substrates. Here, we present a systematic study of top-gated trilayer MoS2 RF transistors with gate lengths scaled down to 70 and 40 nm. In addition, by introducing edge-contacted injection of electrons in trilayer MoS2 devices, we decrease the contact resistance and as a result obtain the highest cutoff frequency of 6 GHz before the de-embedding procedure and 25 GHz after the de-embedding procedure.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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