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arXiv 1111.3424cond-mat.mes-hallphysics.comp-ph
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界面粗糙度散射对硅纳米线晶体管射频性能的影响

Effects of Interface Roughness Scattering on Radio Frequency Performance of Silicon Nanowire Transistors

SungGeun Kim, Mathieu Luisier, Timothy B. Boykin, Gerhard Klimeck

摘要:

分析了n型硅纳米线晶体管(SiNWT)中原子级界面粗糙度对射频性能的影响。采用基于sp3d5s?* 的三维全带量子输运模拟方法,对界面粗糙度散射进行了统计研究。紧约束模型当SiNWT的直径按比例缩小到3nm以下时,IRS导致截止频率的显著降低。粗糙表面引起的导带边的起伏导致电子通过模失配反射。这种效应降低了电子的速度,从而大大降低了截止频率。

英文摘要:

The effects of an atomistic interface roughness in n-type silicon nanowire transistors (SiNWT) on the radio frequency performance are analyzed. Interface roughness scattering (IRS) is statistically investigated through a three dimensional full-band quantum transport simulation based on the sp3d5s?* tight-binding model. As the diameter of the SiNWT is scaled down below 3 nm, IRS causes a significant reduction of the cut-off frequency. The fluctuations of the conduction band edge due to the rough surface lead to a reflection of electrons through mode-mismatch. This effect reduces the velocity of electrons and hence the transconductance considerably causing a cut-off frequency reduction.

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