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arXiv 1606.05972cond-mat.mes-hall
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金属薄膜和纳米线中由于晶界和表面粗糙度散射引起的电阻率标度

Resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scattering

Kristof Moors, Bart Sorée, Wim Magnus

摘要:

基于半经典多子带Boltzmann输运方程的解析解,提出了一种模拟方法,研究了金属薄膜和纳米线中由于晶界和表面粗糙散射引起的电阻率标度。虽然考虑到详细的统计特性的晶粒,粗糙度和屏障材料以及金属能带结构和量子力学方面的散射和限制,该模型不依赖于唯象拟合参数。

英文摘要:

A modeling approach, based on an analytical solution of the semiclassical multi-subband Boltzmann transport equation, is presented to study resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scattering. While taking into account the detailed statistical properties of grains, roughness and barrier material as well as the metallic band structure and quantum mechanical aspects of scattering and confinement, the model does not rely on phenomenological fitting parameters.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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