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arXiv 0906.0924cond-mat.mes-hallcond-mat.mtrl-sci
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石墨烯纳米线互连的电阻率

Resistivity of Graphene Nanoribbon Interconnects

Raghunath Murali, Kevin Brenner, Yinxiao Yang, Thomas Beck, James D. Meindl

摘要:

石墨烯纳米取向的互连制造,和提取的电阻率相比,铜。结果表明,在给定线宽(18nm<W<52nm)下,GNR的平均电阻率约为Cu丝的3倍,而最佳GNR的电阻率与Cu丝相当。的导电性被发现是有限的杂质散射以及LER散射,作为一个结果,最好的报告GNR电阻率是3倍的限制所施加的基板声子散射。这项研究表明,即使是中等质量的石墨烯纳米线也有可能超过Cu用作片上互连。

英文摘要:

Graphene nanoribbon interconnects are fabricated, and the extracted resistivity is compared to that of Cu. It is found that the average resistivity at a given line-width (18nm<W<52nm) is about 3X that of a Cu wire, whereas the best GNR has a resistivity comparable to that of Cu. The conductivity is found to be limited by impurity scattering as well as LER scattering; as a result, the best reported GNR resistivity is 3X the limit imposed by substrate phonon scattering. This study reveals that even moderate-quality graphene nanowires have the potential to outperform Cu for use as on-chip interconnects.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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