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arXiv 0912.1827cond-mat.mes-hallcond-mat.mtrl-sci
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Ge-SixGe1-x核壳纳米线场效应晶体管的标度特性

Scaling Properties of Ge-SixGe1-x Core-Shell Nanowire Field Effect Transistors

Junghyo Nah, En-Shao Liu, Kamran M. Varahramyan, Davood Shahrjerdi, Sanjay K. Banerjee, Emanuel Tutuc

摘要:

我们展示了高性能的Ge-SixGe 1-x核壳纳米线场效应晶体管的制造与高掺杂的源极和漏极,并系统地研究其缩放特性。高掺杂的源极和漏极区域通过低能量硼注入来实现,这使得有效的载流子注入具有比纳米线电阻低得多的接触电阻。我们提取关键的器件参数,如本征沟道电阻,载流子迁移率,有效沟道长度,和外部接触电阻,以及基准器件的开关速度和ON/OFF电流比。

英文摘要:

We demonstrate the fabrication of high-performance Ge-SixGe1-x core-shell nanowire field-effect transistors with highly doped source and drain, and systematically investigate their scaling properties. Highly doped source and drain regions are realized by low energy boron implantation, which enables efficient carrier injection with a contact resistance much lower than the nanowire resistance. We extract key device parameters, such as intrinsic channel resistance, carrier mobility, effective channel length, and external contact resistance, as well as benchmark the device switching speed and ON/OFF current ratio.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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