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arXiv 1503.08978cond-mat.mes-hall
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二维拓扑绝缘体态在宽HgTe量子阱中的持续性

Persistence of two-dimensional topological insulator state in wide HgTe quantum well

E. B. Olshanetsky, Z. D. Kvon, G. M. Gusev, A. D. Levin, O. E. Raichev, N. N. Mikhailov, S. A. Dvoretsky

摘要:

我们的实验研究宽(14 nm)碲化汞量子阱中的电子输运证实了持久性的二维拓扑绝缘体状态以前报道的较窄的井,在那里它是合理的理论。局部和非局部电阻测量的比较表明,在温度低于1 K时,约1 mm尺寸的样品中存在边缘态输运。电阻的温度依赖性表明绝缘间隙的顺序为几毫电子伏。在尺寸小于10 $μ$ m的样品中,观察到通过边缘态的准弹道输运。

英文摘要:

Our experimental studies of electron transport in wide (14 nm) HgTe quantum wells confirm persistence of a two-dimensional topological insulator state reported previously for narrower wells, where it was justified theoretically. Comparison of local and nonlocal resistance measurements indicate edge state transport in the samples of about 1 mm size at temperatures below 1 K. Temperature dependence of the resistances suggests an insulating gap of the order of a few meV. In samples with sizes smaller than 10 $μ$m a quasiballistic transport via the edge states is observed.

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