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arXiv 2012.13738cond-mat.mes-hall
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基于HgTe的拓扑绝缘体

Topological insulators based on HgTe

Z. D. Kvon, D. A. Kozlov, E. B. Olshanetsky, G. M. Gusev, N. N. Mikhailov, S. A. Dvoretsky

摘要:

综述了碲化汞量子阱和碲化汞薄膜在二维和三维拓扑绝缘体(TI)研究中所取得的最有趣的实验结果。在2D TI的情况下,这些包括观察非局部弹道和扩散运输,2D TI的磁击穿,以及边缘通道电阻的异常温度依赖性。在3D TI中,表面二维狄拉克费米子(DF)的高迁移率已达到创纪录的水平。这使得能够确定所有的主要TI参数(体隙和密度的DF在其两个表面上),并提供信息的相位的舒布尼科夫-德哈斯振荡的DF,这表明刚性拓扑耦合之间的费米子自旋和动量。最后对进一步的研究进行了展望。

英文摘要:

The most interesting experimental results obtained in studies of 2D and 3D topological insulators (TIs) based on HgTe quantum wells and films are reviewed. In the case of 2D TIs, these include the observation of nonlocal ballistic and diffusion transport, the magnetic breakdown of 2D TIs, and an anomalous temperature dependence of edge-channel resistance. In 3D TIs, a record-setting high mobility of surface two-dimensional Dirac fermions (DFs) has been attained. This enabled determining all the main TI parameters (the bulk gap and the density of DFs on both of its surfaces) and provided information on the phase of the Shubnikov - de Haas oscillations of DFs, which indicates the rigid topological coupling between the fermion spin and momentum. Prospects for further research are discussed in the conclusion.

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