arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 1503.08299cond-mat.mtrl-sci
收藏

生长应力诱导的薄膜介电常数可调性

Growth Stress Induced Tunability of Dielectric Constant in Thin Films

K. V. L. V. Narayanachari, Hareesh Chandrasekar, Amiya Banerjee, K. B. R. Varma, Rajeev Ranjan, Navakanta Bhat, Srinivasan Raghavan

摘要:

结果表明,生长应力对氧化锆薄膜的介电常数有很大的影响。参数的正确组合-相,纹理和应力-示出产生具有高介电常数和最好的等效氧化物厚度为0.8 nm的膜。应力对介电常数的影响是双重的,首先是对相变的影响,其次是对原子间距离的影响。我们详细讨论和解释了应力、相变和介电常数之间相互作用的物理机制。

英文摘要:

It is demonstrated here that growth stress has a substantial effect on the dielectric constant of zirconia thin films. The correct combination of parameters - phase, texture and stress - is shown to yield films with high dielectric constant and best reported equivalent oxide thickness of 0.8 nm. The stress effect on dielectric constant is twofold, firstly, by the effect on phase transitions and secondly by the effect on interatomic distances. We discuss and explain the physical mechanisms involved in the interplay between the stress, phase changes and the dielectric constant in detail.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑