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arXiv 2104.07089cond-mat.mtrl-sciphysics.app-ph
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介电端基对N2200有机场效应晶体管正偏置应力稳定性的影响

The effect of the dielectric end groups on the positive bias stress stability of N2200 organic field effect transistors

D. Simatos, L. J. Spalek, U. Kraft, M. Nikolka, X. Jiao, C. R. McNeill, D. Venkateshvaran, H. Sirringhaus

摘要:

共轭聚合物场效应晶体管中的偏置应力退化是这些无序材料中的一个基本问题,并且可以追溯到材料与环境物种的相互作用,1,2,3以及制造引起的缺陷。聚合物栅极电介质的端基和相关偶极诱导的无序对偏置应力稳定性的影响迄今为止还没有在高-在这项工作中,N2200晶体管的性能指标进行了检查,与不同的端基(Cytop-M和Cytop-S8)的双金属化。我们假设极性端基会导致偶极诱导的紊乱增加,以及更差的性能。1,9,10长-假设论文中使用的较低温度下的时间退火方案通过允许晶域在溶剂存在下重新组织而导致更好的结晶。11假设较高的结晶度可以缩小诱导能量载体的范围,并且从而降低迁移率的栅极依赖性。结果表明,电介质端基不影响N2200晶体管的偏置应力稳定性。然而,长退火时间导致偏置应力稳定性的显著改善,最稳定的器件具有仅弱依赖于或独立于栅极电压的迁移率。

英文摘要:

Bias stress degradation in conjugated polymer field-effect transistors is a fundamental problem in these disordered materials and can be traced back to interactions of the material with environmental species,1,2,3 as well as fabrication-induced defects.4,5 However, the effect of the end groups of the polymer gate dielectric and the associated dipole-induced disorder on bias stress stability has not been studied so far in high-performing n-type materials, such as N2200.6,7 In this work, the performance metrics of N2200 transistors are examined with respect to dielectrics with different end groups (Cytop-M and Cytop-S8). We hypothesize that the polar end groups would lead to increased dipole-induced disorder, and worse performance.1,9,10 The long-time annealing scheme at lower temperatures used in the paper is assumed to lead to better crystallization by allowing the crystalline domains to reorganize in the presence of the solvent.11 It is hypothesized that the higher crystallinity could narrow down the range at which energy carriers are induced and thus decrease the gate dependence of the mobility. The results show that the dielectric end groups do not influence the bias stress stability of N2200 transistors. However, long annealing times result in a dramatic improvement in bias stress stability, with the most stable devices having a mobility that is only weakly dependent on or independent of gate voltage.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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