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arXiv 0904.2289cond-mat.mtrl-sci
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有机薄膜厚度对六噻吩场效应晶体管偏置应力不稳定性的影响

Organic film thickness influence on the bias stress instability in Sexithiophene Field Effect Transistors

F. V. Di Girolamo, C. Aruta, M. Barra, P. D Angelo, A. Cassinese

摘要:

本文研究了六噻吩(T6)场效应晶体管(FET)中偏置应力现象的动力学。在Si/SiO_2衬底上用真空淀积法制备了厚度为10 ~ 130 nm的T_6 FET。T6薄膜结构分析后,通过X射线衍射和FET的电气调查侧重于载流子迁移率的评估,偏置应力不稳定性参数已估计和讨论的背景下,现有的模型。通过增加膜厚度,应力参数和有机层的结构性质之间的明确的相关性已被突出。相反,迁移率值几乎与厚度无关。

英文摘要:

In this paper, the dynamics of bias stress phenomenon in Sexithiophene (T6) Field Effect Transistors (FETs) has been investigated. T6 FETs have been fabricated by vacuum depositing films with thickness from 10 nm to 130 nm on Si/SiO2 substrates. After the T6 film structural analysis by X-Ray diffraction and the FET electrical investigation focused on carrier mobility evaluation, bias stress instability parameters have been estimated and discussed in the context of existing models. By increasing the film thickness, a clear correlation between the stress parameters and the structural properties of the organic layer has been highlighted. Conversely, the mobility values result almost thickness independent.

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