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arXiv 1202.2015cond-mat.mtrl-sci
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Very low bias stress in n-type organic single crystal transistors

Mario Barra, Flavia V. Di Girolamo, Nikolas A. Minder, Ignacio Gutiérrez Lezama, Zhihua Chen, Antonio Facchetti, Alberto F. Morpurgo, Antonio Cassinese

英文摘要:

Bias stress effects in n-channel organic field-effect transistors (OFETs) are investigated using PDIF-CN2 single-crystal devices with Cytop gate dielectric, both under vacuum and in ambient. We find that the amount of bias stress is very small as compared to all (p-channel) OFETs reported in the literature. Stressing the PDIF-CN2 devices by applying 80 V to the gate for up to a week results in a decrease of the source drain current of only ~1% under vacuum and ~10% in air. This remarkable stability of the devices leads to characteristic time constants, extracted by fitting the data with a stretched exponential - that are τ~ 2\cdot10^9 s in air and τ~ 5\cdot10^9 s in vacuum - approximately two orders of magnitude larger than the best values reported previously for p-channel OFETs.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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