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arXiv 1503.00392cond-mat.mtrl-scicond-mat.mes-hall
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单晶Ir(111)薄膜上的石墨烯-硅层状结构

Graphene-Silicon Layered Structures on Single-crystalline Ir(111) Thin Films

Yande Que, Yong Zhang, Yeliang Wang, Li Huang, Wenyan Xu, Jing Tao, Lijun Wu, Yimei Zhu, Kisslinger Kim, Michael Weinl, Matthias Schreck, Chengmin Shen, Shixuan… 展开作者

Yande Que, Yong Zhang, Yeliang Wang, Li Huang, Wenyan Xu, Jing Tao, Lijun Wu, Yimei Zhu, Kisslinger Kim, Michael Weinl, Matthias Schreck, Chengmin Shen, Shixuan Du, Yunqi Liu, H. -J. Gao

摘要:

单晶过渡金属薄膜是石墨烯和石墨烯基材料外延生长的理想场所。采用插层法在Si衬底上的Ir(111)薄膜上成功地构建了石墨烯-硅层状结构。这种异质层状结构与当前的Si基微电子技术兼容,在未来的微电子和纳米电子器件中显示出很高的应用前景。

英文摘要:

Single-crystalline transition metal films are ideal playing fields for the epitaxial growth of graphene and graphene-base materials. Graphene-silicon layered structures were successfully constructed on Ir(111) thin film on Si substrate with an yttria-stabilized zirconia buffer layer via intercalation approach. Such hetero-layered structures are compatible with current Si-based microelectronic technique, showing high promise for applications in future micro- and nano-electronic devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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