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arXiv 1003.0624cond-mat.mtrl-sci
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石墨烯掺杂机理

Mechanisms of doping graphene

H. Pinto, R. Jones, J. P. Goss, P. R. Briddon

摘要:

我们区分掺杂石墨烯的三种机制。利用密度泛函理论研究了F4-TCNQ等电负性分子和K等电正性金属分别掺杂石墨烯的p型和n型结构。预期这些掺杂剂导致库仑散射引起的载流子迁移率降低,但没有任何滞后效应。第二,Au对双层石墨烯而非单层石墨烯的掺杂表现出一种新的掺杂机制。第三,电化学掺杂受氧化还原反应的影响,并且可以导致通过潮湿气氛的p掺杂和通过NH3和甲苯的n掺杂。

英文摘要:

We distinguish three mechanisms of doping graphene. Density functional theory is used to show that electronegative molecule like F4-TCNQ and electropositive metals like K dope graphene p- and n-type respectively. These dopants are expected to lead to a decrease in carrier mobility arising from Coulomb scattering but without any hysteresis effects. Secondly, a novel doping mechanism is exhibited by Au which dopes bilayer graphene but not single layer. Thirdly, electrochemical doping is effected by redox reactions and can result in p-doping by humid atmospheres and n-doping by NH3 and toluene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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