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arXiv 1111.2459cond-mat.mtrl-sci
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石墨烯在六方氮化硼薄膜中的静电掺杂

Electrostatic doping of graphene through ultrathin hexagonal boron nitride films

Menno Bokdam, Petr A. Khomyakov, Geert Brocks, Zhicheng Zhong, Paul J. Kelly

摘要:

当与石墨烯结合时,六方氮化硼(h-BN)是构建金属h-BN的理想衬底和栅极电介质|石墨烯场效应器件。我们采用第一性原理密度泛函理论(DFT)对Cu| h-BN|石墨烯堆叠以研究石墨烯掺杂如何取决于h-BN层的厚度和施加在Cu和石墨烯之间的电势差。我们开发了一个分析模型,描述了掺杂非常好,使我们能够确定的关键参数,管理设备的行为。预测的石墨烯的本征掺杂对于Al 2 O3-BN层特别突出,并且应该在实验中观察到。它主要是由新的界面项,我们从DFT计算评估的个别材料和h-BN和Cu或石墨烯之间的界面。

英文摘要:

When combined with graphene, hexagonal boron nitride (h-BN) is an ideal substrate and gate dielectric with which to build metalh-BN|graphene field-effect devices. We use first-principles density functional theory (DFT) calculations for Cu|h-BN|graphene stacks to study how the graphene doping depends on the thickness of the h-BN layer and on a potential difference applied between Cu and graphene. We develop an analytical model that describes the doping very well, allowing us to identify the key parameters that govern the device behaviour. A predicted intrinsic doping of graphene is particularly prominent for ultrathin h-BN layers and should be observable in experiment. It is dominated by novel interface terms that we evaluate from DFT calculations for the individual materials and for interfaces between h-BN and Cu or graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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