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arXiv 1209.4502cond-mat.mtrl-sci
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单轴压力下氮化硼界面带隙的可调

Tunable Band Gap of Boron Nitride Interfaces under Uniaxial Pressure

Elizane E. Moraes, Taíse M. Manhabosco, Alan B. de Oliveira, Ronaldo J. C. Batista

摘要:

在这项工作中,我们表明,通过一个密度泛函理论形式主义,氢终止氮化硼表面之间的简单的物理接触引起的金属界面与自由携带相反的符号在每个表面。可以通过施加单轴压力来诱导带隙。随着压力的增加,带隙的大小从零到4.4 eV连续变化,这是根据表面态之间的相互作用来理解的。由于立方氮化硼的高热导率以及带隙和施加的压力之间的耦合,这种可调带隙界面可以用于高稳定性的电子和机电器件中。此外,在界面处的电荷载体的空间分离可能导致光伏应用。

英文摘要:

In this work we show, by means of a density functional theory formalism, that the simple physical contact between hydrogen terminated boron nitride surfaces gives rise to a metallic interface with free carries of opposite sign at each surface. A band gap can be induced by applying uniaxial pressure. The size of the band gap changes continuously from zero up to 4.4 eV with increasing pressure, which is understood in terms of the interaction between surface states. Due to the high thermal conductivity of cubic boron nitride and the coupling between band gap and applied pressure, such tunable band gap interfaces may be used in high stable electronic and electromechanical devices. In addition, the spacial separation of charge carries at the interface may lead to photovoltaic applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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