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arXiv 0801.3619cond-mat.mtrl-scicond-mat.other
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绝缘体与半导体薄膜岛化模型的比较

Comparison between models of insulator and semiconductor thin films islanding

F. Lallet, A. Dauger, N. Olivi-Tran

摘要:

自组织量子点(QD)的合成可以通过自下而上的逐层沉积工艺如化学气相沉积(CVD)或物理气相沉积(PVD)来实现。然而,QD也可以通过溶胶-凝胶路线合成,其涉及从薄膜到离散QD的自发演变而无需进一步沉积。本文的目的是讨论和比较PVD-CVD和溶胶-凝胶两种方法中由薄膜表面粗糙化引发的量子点形成过程中的物理现象。我们提出了两个简单的物理模型,这是相关的,以解释这些方法之间的根本差异。

英文摘要:

The synthesis of self-organized quantum dots (QD's) can be achieved through bottom up layer by layer deposition processes as chemical vapor deposition (CVD) or physical vapor deposition (PVD). However, QD's may also be synthesized via sol-gel route, which involves a spontaneous evolution from thin films to discrete QD's without further deposition. The aim of the paper is to discuss and compare the physical phenomena involved in QD's formation which initiate from thin film surface roughening between PVD-CVD and sol-gel synthesis approaches. We propose two simple physical models which are relevant to explain the fundamental differences between those methods.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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