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arXiv 0704.2703cond-mat.mtrl-sci
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基于在半导体-金属边界处具有薄绝缘层的高电阻率半导体晶体的结构中的光电现象

Photoelectric phenomena in structures based on high-resistivity semiconductor crystals with a thin insulator layer at the semiconductor-metal boundary

P. G. Kasherininov, A. V. Kichaev, A. A. Tomasov

摘要:

一个以前未知的效果-巨大的空间重新分布的电场强度在晶体结构的照明下-被发现和研究在高电阻率(半绝缘)半导体碲化镉晶体(金属-薄绝缘体-半导体-薄绝缘体-金属结构)的实际光敏电阻。本文对高阻半导体晶体中的光电现象提出了一个新的概念.这个概念是基于这样的想法,即在这种条件下,在照明下的载流子寿命保持不变的场的重新分布在这些现象中起着决定性的作用。的效果的性质进行了描述,晶体和绝缘体层的参数的结构的特性的依赖性解释了这种效果的表现形式,和方法来生产规定的光电特性的新设备和科学方法的结构进行检查。

英文摘要:

A previously unknown effect-giant spatial redistribution of the electric field strength in a crystal under illumination of the structure - was discovered and investigated in real photoresistors on high-resistivity (semi-insulating) semiconductor CdTe crystals (in metal-thin insulator- semiconductor-thin insulator -metal structures). A new concept is proposed for photoelectric phenomena in high- resistivity semiconductor crystals. The concept is based on the idea that the redistribution of the field under such conditions that the carrier lifetime remains unchanged under illumination plays a determining role in these phenomena. The nature of the effect is described, the dependence of the characteristics of the structures on the parameters of the crystal and the insulator layers is explained by the manifestation of this effect, and ways to produce structures with prescribed photoelectric characteristics for new devices and scientific methods are examined.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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