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arXiv 1606.04451cond-mat.mes-hallcond-mat.mtrl-sci
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杂质半导体纳米晶薄膜中的金属-绝缘体转变

Metal-insulator transition in films of doped semiconductor nanocrystals

Ting Chen, K. V. Reich, Nicolaas J. Kramer, Han Fu, Uwe R. Kortshagen, B. I. Shklovskii

摘要:

为了充分发挥半导体薄膜作为低成本电子材料的潜力,需要更好地了解使其导电性金属化所需的掺杂剂的量。在体半导体中,金属-绝缘体转变时的电子临界浓度由莫特判据描述。在这里,我们从理论上推导出的临界浓度$n_c$的重掺杂的纳米晶体的膜缺乏配体在其表面和彼此直接接触。在相应的实验中,我们研究了掺磷无配体硅纳米晶体薄膜的导电机制。在我们的样品中实现的最大的电子浓度,这是预测的$n_c$的一半,我们发现,跳跃电子的本地化长度是接近纳米晶体直径的三倍,表明该膜接近金属-绝缘体转变。

英文摘要:

To fully deploy the potential of semiconductor nanocrystal films as low-cost electronic materials, a better understanding of the amount of dopants required to make their conductivity metallic is needed. In bulk semiconductors, the critical concentration of electrons at the metal-insulator transition is described by the Mott criterion. Here, we theoretically derive the critical concentration $n_c$ for films of heavily doped nanocrystals devoid of ligands at their surface and in direct contact with each other. In the accompanying experiments, we investigate the conduction mechanism in films of phosphorus-doped, ligand-free silicon nanocrystals. At the largest electron concentration achieved in our samples, which is half the predicted $n_c$, we find that the localization length of hopping electrons is close to three times the nanocrystals diameter, indicating that the film approaches the metal-insulator transition.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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