arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2303.00166physics.opticsphysics.app-ph
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超高速高分辨率laser光刻技术在锂离子集成光子学中的应用

Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics

Jinming Chen, Zhaoxiang Liu, Lvbin Song, Chao Sun, Guanhua Wang, Ya Cheng

摘要:

光刻辅助化学机械蚀刻(PLACE)是一种专门开发用于在薄膜锂酸盐(TFLN)上制造高质量大规模光子集成电路(PIC)的技术,其使得能够制造从高质量(高Q)微谐振器和低损耗波导到电光(EO)可调谐激光器和波导放大器的一系列PIC构建块。针对PIC器件和系统的高产量制造,我们已经开发了一种超高速高分辨率激光光刻制造系统,采用高重复频率飞秒激光和高速多边形激光扫描仪,通过该光刻制造系统,在200 nm的空间分辨率下,光刻制造效率为4.8 cm 2/h。我们展示了基于TFLN的光子结构,光学相位掩模以及彩色印刷的晶圆级制造

英文摘要:

Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating highquality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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