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arXiv 2008.12906cond-mat.mes-hall
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利用超低电压电子束光刻技术调控LaAlO3/SrTiO3金属-绝缘体转变

Nanoscale control of LaAlO3/SrTiO3 metal-insulator transition using ultra-low-voltage electron-beam lithography

University of Pittsburgh(匹兹堡大学);University of Wisconsin-Madison(威斯康星大学麦迪逊分校)

Dengyu Yang, Shan Hao, Jun Chen, Qing Guo, Muqing Yu, Yang Hu, KiTae Eom, Jung-Woo Lee, Chang-Beom Eom, Patrick Irvin, Jeremy Levy

AI总结:

通过超低电压电子束光刻技术实现对LaAlO3/SrTiO3界面金属-绝缘体转变的精确调控,并在低温下观察到超导行为。

摘要:

我们描述了一种利用超低电压电子束光刻(ULV-EBL)控制LaAlO3/SrTiO3界面绝缘体-金属转变的方法。与以往利用导电原子力显微镜光刻(c-AFM)的报道相比,这种方法在写入速度(10 mm/s)上可达c-AFM的10000倍,且能提供相似的分辨率(约10 nm)。该写入技术是非破坏性的,其导电状态可通过长时间暴露在空气中恢复。在毫开尔文温度下测量了代表性器件的输运性质,观察到超导行为。我们还展示了在石墨烯/LaAlO3/SrTiO3异质结构上创建导电器件的能力。其 underlying mechanism 被认为与调节c-AFM方法的相同机制密切相关。

英文摘要:

We describe a method to control the insulator-metal transition at the LaAlO3/SrTiO3 interface using ultra-low-voltage electron beam lithography (ULV-EBL). Compared with previous reports that utilize conductive atomic-force-microscope lithography (c-AFM), this approach can provide comparable resolution (~10 nm) at write speeds (10 mm/s) that are up to 10,000x faster than c-AFM. The writing technique is non-destructive and the conductive state is reversible via prolonged exposure to air. Transport properties of representative devices are measured at milli-Kelvin temperatures, where superconducting behavior is observed. We also demonstrate the ability to create conducting devices on graphene/LaAlO3/SrTiO3 heterostructures. The underlying mechanism is believed to be closely related to the same mechanism regulating c-AFM-based methods.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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