arXiv 1402.21892014-02-10cond-mat.mes-hallphysics.optics

Nanopatterning by Laser Interference Lithography: Applications to Optical Devices

Jung-Hun Seo, Jung Ho Park, Zhenqiang Ma, Jinnil Choi, Byeong-Kwon Ju

备注：: 16 pages, 13 figures
DOI：: 10.1166/jnn.2014.9199

英文摘要：

A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials which are the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nano photonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.

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